화학소재솔루션센터

1) Additional Microwave Plasma Source
- Dimension: 640*155*200mm (W*H*D)
- 2.46 GHz, Each 2 kw continuous power / 4.0 kw pulse power
- Gas connection : Reactive + Inert gases connector
2) Pre-treatment by parallel plate plasma arrangement
- power supply by RF (13.56 MHz) Generator
- 사용가스: Argon, Oxgen, Ammonia (각 가스별 MFC설치)
3) Optical spectroscopy of the plasma
- Optical analyzing of the properties of the generated plasma(실시간 모니터링)
- Optical spectroscopy operated by fiber optics
- Being mounted on a separate view port of the process chamber
4) Residual Gas analyzer
- Residual Gas Analyzer: 분석영역(1~100 amu)
- Measuring gas residues at base pressure level
5) Power supply for process drum bias
- Integration of a pulsed DC power supply for the existing process drum
- Unipolar DC pulse: 0~300 V, Frequency: 0~150 kHz, Power: 5 kW
6) Cold trap for unwinder
- Cooled area approx. 600×600 mm^2, Pumping speed: 1000 l/s
- cooler, heater, compressor 포함