○ FIB System Upgrade module for KITECH / Nano Nano Lab 600 (D116) - Upgrade package for Nova NanoLab - D116 including:
- new Microscope PC with Windows XP and xT SW V3.8.8, incl. Application SW
- new Support PC with Windows XP
- PIA scan and patterning engine incl. USB CCD camera
- 6-Channel Solid State Amplifier Mk2.

○ Scanning system : High-resolution digital scanning engine controlled from the User Interface.
- Resolution: 512x442, 1024x884, 2048x1768, 4096x3536 pixels
- Minimum Dwell Time: 25 ns/pixel
- Electronic scan rotation by n x 360 degrees

○ Patterning system : High-resolution digital patterning engine controlled from the User Interface
- Maximum resolution: 64k x 64k
- Maximum pattern size: 8M pixels
- Minimum Dwell Time: 25 ns/pixel
- Maximum Dwell Time: 25 ms/pixel
- Multiple pattern shapes
- Variable dwell time pattern to give 3D milling
- Complex milling patterns through Bitmap import.
○ Combines scan and acquisition in single card
- This direct response enables increased robustness and reliability

○ Expanded patterning capabilities
- 16 bit beam placement accuracy allows high resolution patterning on large writing fields
- Increased dwell range improves “TV” rate imaging for navigation on charging samples
- Up to 8 million dwell points allow easy patterning of large areas with relatively small beam currents

○ Better image quality (Signal to Noise)
- > 45% at short dwell times
- ~ 20% over full dwell range
○ Rigid-/Flexible-PCB에서의 활용 : 고밀도 PCB 관련 분석지원 수요 증가
- 결정립계 attack 등의 관찰이 필요한 black pad 분석
- 미세 패턴 사이의 잔류물이나 이물질과 기판과의 계면형태 분석
- Flxible PCB 제조를 위하여 기판 상에 형성하는 seed layer 계면 및 단면 관찰
○ Packaging 분야 : 다층으로 형성된 계면 관찰 등에 활용
- 와이어 본딩 불량 패드의 단면 관찰을 통한 불량원인 분석 등
- 볼본딩 패드의 하부 조직 관찰 (IMC층 형성여부, 크랙 발생 여부 등)
○ 반도체 분야 : 단층 혹은 다층으로 형성된 박막 계면 관찰 등에 활용
- Ion Beam을 이용한 반도체 회로에칭 및 미소부품 성형 가공
- 박막이 증착된 샘플의 단면구조 분석 및 reverse engineering 등
- 다마신 공정으로 충진한 Cu Gap-fill 특성 분석
- 박막 증착상태 및 step coverage 등 조사
○ 기타 분야 : 표면처리 시편 분석 등
- 도금층을 비롯한 박막층에 대한 단면 시편 가공 및 고배율/고해상도 형상 분석
- 표면구조 관찰 후 특정부위 단면관찰 등 도금 등의 불량원인 분석
- 투과전자현미경 관찰을 위한 TEM 샘플 준비 시

○ FIB System Upgrade module for KITECH / Nano Nano Lab 600 (D116) - Upgrade package for Nova NanoLab - D116 including:
- new Microscope PC with Windows XP and xT SW V3.8.8, incl. Application SW
- new Support PC with Windows XP
- PIA scan and patterning engine incl. USB CCD camera
- 6-Channel Solid State Amplifier Mk2.

○ Scanning system : High-resolution digital scanning engine controlled from the User Interface.
- Resolution: 512x442, 1024x884, 2048x1768, 4096x3536 pixels
- Minimum Dwell Time: 25 ns/pixel
- Electronic scan rotation by n x 360 degrees

○ Patterning system : High-resolution digital patterning engine controlled from the User Interface
- Maximum resolution: 64k x 64k
- Maximum pattern size: 8M pixels
- Minimum Dwell Time: 25 ns/pixel
- Maximum Dwell Time: 25 ms/pixel
- Multiple pattern shapes
- Variable dwell time pattern to give 3D milling
- Complex milling patterns through Bitmap import.