HORIBAJOBIN YVON
GD-Profiler
주장비
분석
화합물 전처리·분석장비 > 달리 분류되지 않는 화합물 전처리 분석장비 >
2013-06-22
292,334,030원
원
(1) Polychromator (simultaneous)
(2) Monochromator (sequential)
(3) Image navigator (qualitative analysis)
(4) Generator
(5) RF Glow Discharge lamp
(6) Data processing
(7) Software & Accessories
(1) High resolution, simultaneous spectroanalyzer with a RF Glow Discharge Source for depth profile and bulk analysis of conductive and non-conductive samples or layers.
(2) The GD-OES permits the fast analysis of solid samples or pellets, and the control of coatings, surfaces and interfaces.
(3) Various fields of use include plasma vapor deposition, PV, paints, galvanizations, nitration, lacquers, resins, nuclear materials, oxides, ceramics, semi conductors, and glasses.
(4) Typical depth profile obtained in one shot with the GDS goes from a few tenths of nanometers to 150 micrometers.
(5) All elements including the gases can be analyzed simultaneously.
- 금호전기, DCT, 엘지이노텍, 삼성SDI, 현대아반시스, 대양금속 :
CIGS 박막소재 분석에 활용
- 큐닉스, OCI, 솔라월드 코리아, 정남시스템: Si 박막소재 분석에 활용
(1) High resolution, simultaneous spectroanalyzer with a RF Glow Discharge Source for depth profile and bulk analysis of conductive and non-conductive samples or layers. (2) The GD-OES permits the fast analysis of solid samples or pellets, and the control of coatings, surfaces and interfaces. (3) Various fields of use include plasma vapor deposition, PV, paints, galvanizations, nitration, lacquers, resins, nuclear materials, oxides, ceramics, semi conductors, and glasses. (4) Typical depth profile obtained in one shot with the GDS goes from a few tenths of nanometers to 150 micrometers. (5) All elements including the gases can be analyzed simultaneously.