1. Extreme High Resolution FE-SEM System Specification
1) Electron optics
(1) High-stability Schottky Field Emission Type
(2) Electron Beam Resolution - 0.6 nm at 15 – 2 kV or less
- 0.7 nm at 1 kV or less
- 1.0 nm at 500 V or less
(3) Acceleration Voltage : 350 V to 30 kV or wider
(4) Landing energies : 20 V to 30 kV or wider
(5) Beam current : 0.8 pA – 100 nA or wider
(6) Include Beam Deceleration Technology
(7) Monochromator SEM technology is required to reduce the beam energy spread

3) Vacuum System
(1) Oil free vacuum system
(2) Chamber vacuum: <2.6×10-6 mbar
(3) Evacuation time: <5 minutes

4) Specimen Stage
(1) High-precision five-axis motorized stage with Piezo-driven XYR axis
(2) X,Y: 150 × 150 mm2 or bigger
(3) Z range: 10 mm or bigger
(4) Tilt range: -10° to +60° or wider
(5) Rotation : 360° (endless)
(6) X, Y repeatability : 1 μm or less
(7) Max sample height: 55 mm to eucentric point or higher
(8) Max sample weight: 500g