1. Ion Milling unit
1) Accelerating voltage : Max. 8 kV or more
2) Ion beam diameter : 500 um or more
3) Ar gas flow control : High accuracy mass flow control
4) Milling rate
- Cross-section milling : over than 1,000 um/hr on Si

2. Cross-section milling holder unit
1) X movement : ±6 mm or more
2) Y movement : 0 to 2.5 mm or more
3) Swing angle : ±30° or ±15°, ±30°, ±40°
4) Maximum sample size : 10 mm(W) x 10 mm(D) x 4 mm(H) or more
5) Milling area with wide milling holder unit : 8 mm width or more

3. Stage for flat milling holder unit
1) X movement : 0 to 5 mm or more
2) Maximum sample size : 32 mm diameter x 15 mm(H) or more
3) Milling area : Fully 21 mm diameter or more

4. Cooling temperature control unit
1) Cooling method : LN2
2) LN2 dewar bottle capacity : 800 cc or more
3) Temperature setting range : 0 to –100 ℃ or more
4) Minimum setting temperature : 1 ℃ or less

5. Vacuum system
1) Pumping system
- Main pump × 1 + Sub pump × 1 or more