Heidelberg Instrument
MLA150
10년
주장비
시험
기계가공·시험장비 > 반도체장비 > 리소그래픽장비
2021-12-23
647,904,499원
기관의뢰
고정형
시간별
200,000원
마스크리스 얼라인 장비는 반도체 공정 중의 기본인 리소 공정을 구현하는 장비이며, 기존 lithography 장비와 달리, 마스크 제작이 필요 없으며, 수 마이크로 수준의 고성능 패턴 제작에 필요한 핵심 공정 장비임.
가. System Configuration
1) Grating Light Valve or Digital Micro-mirror Device based direct image exposure engine.
2) Stripe width laser (wavelength : 405nm)
3) Top-side Alignment
4) Grayscale mode
5) Autofocus
6) Auto load & unload and Auto alignment system
7) Minimum ~ Maximum exposure area
■ 5mm×5mm ~ 200mm×200mm
8) Minimum ~ Maximum Substrate loading size
■ 5mm×5mm ~ 200×200mm
9) Minimum Feature size ≦ 2.0um
■ It should be upgradable to 0.8um within one year, and after upgrade, it should be easy to switchable to 0.8um and 2um.
10) Maximum write speed
■ 500 ㎟/min or faster
11) Stage interferometer resolution ≦ 10nm
12) Light Source
■ Laser Diode
■ Wavelength : 405nm
■ Output Power ≧ 300mW(405nm)
13) 2nd layer alignment accuracy ≦ 0.5um in 3σ
14) Real-time Auto focus system with dynamic range ≧ ±80um
15) System control and conversion PC
■ Window 10 operating environment
■ Data rate: 6GBit/sec
■ 19“ monitor or more wide
16) Conversion software support file formats
■ DXF, BMP, GDSII, TIFF support
17) System Dimension (Height x Width x depth, weight)
■ ≦ 2000mm x 1297mm x 1537mm, 1500kg
나. Utility and operation environment requirement
1) Clean compressed air
■ Pressure : 6~10 bar, variation ≤0.5 bar
■ Flow : Continuos flow 10 SL/min, Incidentally up to 70 SL/min
2) Vacuum
■ Pressure : Min. 0.5 bar
■ Capacity : Min. 5 SL/min
■ Connector : 6mm inner diameter (ID), 8mm outer diameter (OD) hose
3) Temperature : 18 ~ 24 ℃, stability ±1℃
4) Humidity : 30 ~ 50 % during operation, variation ±5%
5) Cleanness : class 1000 or under
6) Electrical Power requirement : 230 VAC (50/60Hz), Single phase, 20A
다. Safety
1) Emergency stop: system shut down by pushing Emergency stop button
2) Door open sensor: user cannot start to exposure while the sample loading door is open. If user opens the sample loading door while the system is initializing the stages or is operating exposure, system turns off the light source and stops all the stages.