1. PZT 전용 RF Magnetron Sputter
○ Process Module
- Deposition Uniformity : ≤ ±2% @ 3,000Å within 8inch Wafer [(Max-Min)/(Max+Min)] x100, Exclusive 6mm Edge
- PZT 부착력: Peel off test [ASTM D3359-09] : ≥ 4B - Robot Arm 이송 정밀도 : x  ±0.1mm
- Step Coverage : > 40% - Robot Arm 정밀도 : x  ±0.1mm - Substrate Heating Temp. 500°C
- Process Chamber and Inner Shield
- Low Vacuum, Rotary pump 40㎥/h, leybold
- NW40 Angle Valve and Pumping Line
- High Vacuum TMP, 2100L/sec, Leybold
- ISO250 Main Valve, Throttle Valve
- Pirani Gauge 2ea, Cold Cathode Gauge, ATM Sensor
- Baratron Gauge (0.1Torr)
- 12inch Moving Magnet Cathode
- 8inch Substrate Module
- Gas Delivery Unit(MFC and Gas Valve)
- MFC 용량 : N2/Ar=100sccm, O2=20sccm
- 13.56MHz RF Generator 2kW, Matching Unit
- 시운전 코팅 균일도 평가용 12“ PZT Target

○ Loadlock Module
- Loadlock Chamber (Aluminum, Top door type)
- Transfer Robot Arm
- Low Vacuum, Rotary Pump, 40㎥/H, Leybold
- Pirani Gauge, ATM sensor
- Loadlock plasma treatment

○ System Controller
- 19inch Control Rack 및 PLC, 전장품 일체 포함
- PC and HMI Software (Cimon)
- Full Automatic Control
- Water Flow Meter including Temp. Indigator
- Chiller 5RT 포함
- HMI: Full Auto Process, data logging, Recipe 등 저장 가능, 원격지원 가능할 것

2. PZT 전용 Anneal System
- 상온-700°C 고속 승온(65°C/min)-->700°C 유지(30min)-->700°C-상온 저속 냉각(3.2°C/min)냉각 가능 전용
- 웨이퍼 내 Heating 온도 Uniformity :  ±1%
- Heater Max. Temp 1,000°C
- 저속 냉각 구간 온도 제어 : 히터 온도 + N2 유량 제어 조합
- Stainless Steel Chamber, Wall Cooling
- Quartz Sample Holder for Max 8“ Size
- Rotary Pump (500L/min)
- Pumping Line and 2 step Valve
- Vacuum Gauge (Low vacuum), ATM sensor
- MFC and Gas Valve, Gas line 1/4“, N2
- Heater Controller, Automatic Temp. Control
- PC Control based on PLC
- 기타 Utility 및 Frame