1. Electron optics
- High stability Schottky thermal field emitter
- Electron Beam Resolution : 0.6 nm at 15 kV, 0.7 nm at 1 kV
- Electron Beam Energy : 350 V to 30 KV
- Probe Current : 0.8 pA to 100 nA

2. Ion optics
- Ion Source : Ga Liquid Metal Ion Source
- Resolution : 2.5 nm
- Accelerating voltage : 500 V to 30 KV
- Probe Current : 1.1 pA to 100 nA

3. Gas Injection system (Pt, W, C)

4. Specimen Stage
- Eucentric Piezo stage
- X, Y : 150 mm
- Z : 10 mm
- Tilt : -10° to +60°
- rotation : 360° continuous

5. Detectors
- In-lens SE and BSE detector
- Everhart-Thornley Secondary electron detector
- In-column detectors: Low and high energy loss detection
- Retractable STEM 3+ detector
- IR Camera view in the chamber
- Chamber integrated Navigation camera
- Retractable solid state Backscatter detector
- Plasma cleaner system

6. SDD type EDS (129 eV)
- LN2-free high-speed SDD type Detector : 60 mm2
- Resolution : 129 eV at MnKa
- Fetecting element range : Be (4) to Cf (98)

7. NanoManipulator system
Embedded SW controlled sample lift out manipulator system and rotation
- Drift : 50 nm / min 미만
- Smallest step size : 50 nm
- True Z movement over 5 um move : 500 nm 미만
- Vibration : 15 nm 미만
- Omnidirectional repeatability : 150 nm 미만
- Motorized Rotation