마이다스시스템
MDA-400S
1년
주장비
생산
기계가공·시험장비 > 반도체장비 > 리소그래픽장비
2013-10-29
62,000,000원
원
- Manual Align & 5.7 in. PC Control system
- Sample size : 100x 100mm / 4in. wafer
- Mask size : 5in. x 5in.
- UV Exposure Light source with 350Watt Power Supply
- Dual CCD zoom microscope and LCD ( 19 inch ) monitor
- Alignment Tooling Module with X,Y,Z and Theta motion
- Wedge Error Compensation System (leveling plate type)
- Dimension : 1000 (W) x 950 (D) x 850 (H) mm
- Weight : 250 Kg
- Warranty : 1 year
A. Light source module
-Lamp type : Mercury Short arc lamp (350W)
-Wavelength : 350nm to 450nm
-Max. beam size : 6.25 in. x 6.25in.
-365nm Intensity : > max 25 mW/cm2
-Beam uniformity : <±3% (4in.)
B. Microscope
- Dual CCD zoom microscope
- Manual moving stage : Dual X, Y, Z axis
- Objective spacing : 60 ~ 100mm
- Move range : Y Axis ± 20 mm
- 19” LCD Monitor
- Magnification : 90x ~500x
- Working distance : 86 mm / 32 mm
Micro Scope 2x Attachment 180x~1000x
C. Stage and controller module
- Exposure timer : 0.1 sec to 6000sec
- Stage movement : X,Y,Z and Theta
X, Y : 10 mm,
Theta : ±4°
Z Motion travel : 10 mm
- Contact mode : Vacuum, Hard, Soft Contact & Proximity(Gap controllable)
Vacuum & Hard contact (Force controllable)
- Alignment accuracy : <±1.0 micron
- Vacuum / Pneumatic Controls :
Substrate, Mask, Chuck lock & Contact
D. Resolution
- Vacuum Contact : 1um < Thin PR(Thickness1um) @ Full size Si Wafer>
- Hard (Pressure) Contact : 2um
- Soft contact : 3um
- 20um Proximity : 5um