Hitachi
IM4000
5년
주장비
분석
화합물 전처리·분석장비 > 달리 분류되지 않는 화합물 전처리 분석장비 >
2015-02-10
161,213,537원
기관의뢰
고정형
시간별
39,000원
1. This system could involve shaving (also referred to as etching) the specimen surface or cross-section by exploiting the sputtering phenomenon.
2. This system should be eliminated flaws or distortions by argon ion beam, which cannot be removed through mechanical grinding or setting and reduced ion beam streaks by using the flat milling holder or cross-section milling holder.
◆ Ion gun - Type : Penning type or Saddle field type Ar gun
- Accelerating voltage : 0 ~ 6KV or wider
- Milling rate
ㆍFlat : 2μm/Hr or better
ㆍCross-section : 150μm/Hr or better
- Ar gas flow control : High accuracy mass flow control
◆ Stage for cross-section milling - X movement : ±7mm or wider
- Y movement : 0 ~ 3mm or wider
- Sample rotation : ±3° or wider
- Swing angle : Various steps are selectable
- Sample swing speed : Various steps are selectable
- Max. sample size : 20mm(W) × 12mm(D) × 7mm(H) or larger
◆ Stage for flat milling - X movement : 0 ~ 5mm or wider
- Tilt : 0 ~ 90° or wider
- Sample rotation : ±5° or wider
- Swing angle : Various steps are selectable