Gl Corporation
GATANMODEL691
10년
주장비
계측
기계가공·시험장비 > 반도체장비 > 식각장비
2012-03-21
150,000,000원
고정형
원
A. Features :
1. This is a TEM sample preparation equipment that thins the 3 mm disk with bench top dedicated low angle ion mill which is capable of very high thinning rates.
2. Beam current is continuously monitored using a Faraday cup assembly. The ion guns are independently adjustable for single or double sided milling from angle ±10º down to 0º.
3. The system is oil free, clean vacuum, and equipped with ion beam modulation system used for thinning cross sections. The specimen is observable both in the working position and in the airlock. The completion of thinning is detected by a ray sensor which automatically terminates the thinning.
B. Specifications :
I. Ion milling chamber and beam tilt
1. Number of ion source : 2
2. Beam tilt : 0º to ± 10º
3. Number of chamber : 1
4. Chamber size : Very compact
5. Double-sided milling down to 0º
II. Variable specimen control
1. continuous rotation : 1 to 6 rpm
2. Rotation speed control for XTEM specimen Magnification :
a. Polishing sector speed : Up to 6 rpm
b.Outside the polishing sector : 12 rpm
3. Differential thinning in XTEM specimen Single or double sector ion beam modulator which turns off the ion beam automatically.
4. Very fast specimen exchange : Less than 30 seconds
5. Each polishing sector : 60º (±30º normal to the glue-line)
III. Ion source
1. Ion source type : Penning type
2. Beam energy : 0.1 keV – 6 keV
3. Beam density : 10 mA/cm2 per source
4. Driving gas : Argon
5. Beam alignment : X/Y Micrometer drives tilt guns up to ±3º
6. Gun tilt : Both gun tilt continuously and independently variable in the range 0 - ±10º
7. Beam diameter : About 350 µm
8. Ion source life time : Virtually permanent with a periodical cleaning
IV. Automatic termination and specimen observation
1. By digital process timer : 0.1 sec to 23 hr 59 min
2. By stereo microscope (dual power 40x, 80x)
3. Electronic auto terminator
V. Vacuum system
1. Oil free vacuum system : 60 liters molecular drag pump with a two stage diaphragm pump
2. Base pressure : 4 X 10-6 torr (time ; less than 15 min)
3. Operating pressure : 4 X 10-5 torr
4. Simple penning gauge to monitor the pressure
5. Specimen airlock system : Specimen exchange time less than 30 second
6. The vacuum system is designed to hold vacuum when the power is turned off.
7. Auto-shutdown feature to turn the power off when the system is not in use.
VI. Ion milling rate
The milling rate at 4˚ obtained in the Ion milling system for various materials using one ion gun at 5keV and no specimen rotation.
(1) Copper : 18㎛/hr/gun
(2) Silicon : 15㎛/hr/gun
(3) Silicon carbide : 8㎛/hr/gun
(4) Stainless steel : 7㎛/hr/gun
(5) Tantalum : 4㎛/hr/gun
VII. Dimensions and utilities
1. Overall size : 560mm (W) x 360mm (D) x 410mm (H)
2. Shipping weight : 45kg
3. Power : 220V, 60 Hz
VIII. Cooling stage
1. Electronic temperature regulation : -180ºc ~ +100ºc
2. Fast cool down & warm up time : 10 minutes for each
3. Easy to fill Dewar with 3-4 hr capacity
4. Controller display monitors conductor temperature
IX. Dual beam modulation
Facilitates thinning of cross sections by switching off ion beam when aligned with glue line.
Single or double sector mode front panel switch.
X. Low energy Ion Milling
0.1 keV ~ 6 keV available
XI. Duopost loading dock with tweezers