과제명 : 반도체광원시험생산기술지원
과제 책임자 : 김왕기



에피택시는 1970년대 초에 화합물 반도체의 고순도 에피택셜 층을 성장시키는 수단으로서 개발되었다.


MBE에서 반도체의 구성 성분은 분자빔의 형태로 가열된 결정성의 기질에 들러붙어 얇은 에피택셜 층을 형성한다.


A. Features

1. Process
: n-ZnSe film deposition
- Deposition materials: Zn, Se, ZnCl2
- Deposition thickness: 8 up to 80 quarter wave signal (5,000Å - 5μm)
- Substrate size: OD 355 mm (3 inch wafer × 10 sheets)
- Substrate loading and unloading: Automation from loadlock chamber
- Purpose: Mass production

2. Deposition Control
- Deposition: Effusion cell (500℃, 100cc)
- Film thickness measurement: Optical monitoring system
- Effusion cell control: user programmable by PC with touch screen
- Heating element: IR lamp heater
- Temperature control: PID control and PC
- System control: based PLC and PC with touch screen

3. Performance
- Base pressure: 5 x 10-9 Torr (Cryo pump)
- Throughput: 3 inch wafer × 10 sheets / batch (one run)
- Thickness uniformity: ≤ ± 5% (within wafer and wafer to wafer)
- Substrate rotation speed: 0∼30 rpm (usually 20 rpm)
- Substrate temperature: Max. 400℃ (usually 300℃)
- Temperature uniformity: ≤ 5℃ at 300℃
- Manual and automation operation based PLC and PC with touch screen


B. Specifications

1. Process Reactor Module

1) Process Chamber: 1 set
- Material: Electro-polished SUS304
- Shape & size: A hinged front door type with window (ID450 × H750 mm)
- Sample (un)loading: Automation
- Port: View (with shutter), Pumping, Guage, Venting, Effusion cell, Optical monitoring system port, Electrical feedthrough, Temperature sensor port, In-situ monitoring port,
etc.
- Contamination shield cover: SUS304, 2set
- External cooling water line

2) Loadlock Chamber: 1 set
- Material: Electro-polished SUS304
- Shape & size: A hinged front door type with window (ID550 × H200 mm)
- Sample transfer: Motor driven automation, 24 inch linear travel length
- Motor controller, 1 set
- Substrate position aligner
- Port: View port, Pumping, Guage, Venting, sample transfer port, etc.

3) Substrate Holder Unit: 1set
- Motor driven substrate holder
- Holder size: ID 355 mm (3 inch wafer × 10 sheets / batch )
- Rotation speed is adjustable (0∼30rpm)
- Motor controller, 1 set

4) Substrate Heating Unit: 1 set
- Heating element: IR lamp heater (1 kW × 5 pcs)
- Max. temperature: 400℃
- Power supply: 5 kW × 1 set
- Temperature controllers: control modes on/off and PID control

5) Shutter Unit: 1set
- Motor driven automation, 24 inch linear travel length
- Motor controller, 1 set
- Shutter size: ID 400 mm

2. Vacuum Module

1) Pumping Unit
A. Main pump:
- Cryo pump: 1 set
- Pumping speed: 7,000ℓ/s (H2O), 2,400ℓ/s (N2)
- Water-cooled compressor: 1 set
- Chill down time: 80 min
B. Roughing pump:
a) Turbo molecular pump, 1 set
- Pumping speed : 350ℓ/s (N2)
- Controller, 1 set
- Ultimate pressure : 5 x 10-9 Torr
b) Dry pump, 1 set
- Pumping speed: 120 m3/h
- Inert Port: NW50
- Water cooling
- Including with silencer