SNTEK
ICP
4년
주장비
생산
기계가공·시험장비 > 반도체장비 > 식각장비
2006-11-08
281,000,000원
고정형
건별
100,000원
특징
- ICP source and single etch chamber - Feasibility of 8 inch wafer - Fully automatic control system
활용분야
미세 패턴 형성 및 반도체 에칭 공정
* ICP Source & Single Etch Chamber.
* High Pumping speed & Characterized pumping channel
* Independently controlled Source power and bias power.
* Feasibility of 8 inch Wafer.
* Loading/Unloading Chamber for Rapid Processing & Non Contamination
* Fully automatic control system for process operations
- Process gases : [CF4, SF6, BCl3, Cl2, Ar, O2, N2]
- Purge gas : N2
- Process gases : [CF4 SF6 BCl3 Cl2 Ar O2 N2] - Purge gas : N2
* ICP Source & Single Etch Chamber.
* High Pumping speed & Characterized pumping channel
* Independently controlled Source power and bias power.