OXFORD
PLASMALAB 80 PLUS
9년
주장비
분석
기계가공·시험장비 > 반도체장비 > 식각장비
2006-02-14
178,657,190원
고정형
기타
86,820원
[용도]
1. 반도체 소자 및 부분품 분석
2. 불량분석용(Passivation Strip)
[사양]
1. Chamber can process Max. 8 inch wafer 2. Reactive ion etching system that can be used to anisotropic ally etch all types of Si films. 3. Programmable 10 recipes with 4 steps for each step controlled with computer 4. RF /RF Power :13.56MHz /≥ 300W 5. Etching Rate :>60nm/m 6. Uniformity :<±5% 7. GAS Supply: CF4,O2,Ar
1. Chamber can process Max. 8 inch wafer 2. Reactive ion etching system that can be used to anisotropic ally etch all types of Si films. 3. Programmable 10 recipes with 4 steps for each step controlled with computer 4. RF /RF Power :13.56MHz /≥ 300W 5. Etching Rate :>60nm/m 6. Uniformity :<±5% 7. GAS Supply: CF4,O2,Ar