오에프티㈜
MS series
10년
주장비
생산
기계가공·시험장비 > 반도체장비 > 리소그래픽장비
2005-02-22
195,000,000원
고정형
기타
855,000원
* Wafer Size : 4" ~ 6"* Cassette : 1/4" × 25 racks * Spin motor : Brushless servo motor,
Spin speed 10rpm ~ 6,000rpm ± 1.5
rpm(when loading 8" dia. Wafer) Max.
acceleration 30,000rpm/sec* wafer transfer :single transfer robot or
multi transfer robot * composition : Spin Coater/Spin Developer
* Chemical : thinner, AZ1512, DPR i-5500,
AZ 300, DPD 200
* DPR i-5500 Coater - LPAH Plate (120/60sec),
Cool Plate ( 60sec ), Coater (i-5500), Hot Plate
1 (90/90sec)
* AZ 1512 Coater – LPAH Plate(120/60sec),
Cool Plate (60sec), Coater (AZ-1512), HotPlate
1 (90/60sec)
* Develop DPD 200 – Hotplate1 (110/90sec),
Cool Plate (60sec), Developer (45sec), Hot
pate2 (120/60sec)
* Develop AZ 300 – Developer, Hot pate2 (120/180sec)
* Wafer Size : 4" ~ 6"* Cassette : 1/4" × 25 racks * Spin motor : Brushless servo motor,
Spin speed 10rpm ~ 6,000rpm ± 1.5
rpm(when loading 8" dia. Wafer) Max.
acceleration 30,000rpm/sec* wafer transfer :single transfer robot or
multi transfer robot * composition : Spin Coater/Spin Developer
* Chemical : thinner, AZ1512, DPR i-5500,
AZ 300, DPD 200
* DPR i-5500 Coater - LPAH Plate (120/60sec),
Cool Plate ( 60sec ), Coater (i-5500), Hot Plate
1 (90/90sec)
* AZ 1512 Coater – LPAH Plate(120/60sec),
Cool Plate (60sec), Coater (AZ-1512), HotPlate
1 (90/60sec)
* Develop DPD 200 – Hotplate1 (110/90sec),
Cool Plate (60sec), Developer (45sec), Hot
pate2 (120/60sec)
* Develop AZ 300 – Developer, Hot pate2 (120/180sec)