oxford
Plasmalab 80+
13년
주장비
생산
기계가공·시험장비 > 반도체장비 > 식각장비
2003-09-01
183,862,000원
고정형
시간별
0원
식각물질:Al Ti TiN W - Wafer:4~6인치 - single / uniformity:~5% - Process Chamber : Rie process chamber with single viewport & Blanked KF40 port at rear optical emission EFD - Power supplies & plasma sources : RF Generator limited to 300W & airvane capacitor automatch uinte for RIE - Vacuum Measurement : 1 Torr capacittance manometer and active penning gauge - Base Unite : System console with controller & PC2000 system for etching + manuals on CD
식각물질:Al Ti TiN W - Wafer:4~6인치 - single / uniformity:~5% - Process Chamber : Rie process chamber with single viewport & Blanked KF40 port at rear optical emission EFD - Power supplies & plasma sources : RF Generator limited to 300W & airvane capacitor automatch uinte for RIE - Vacuum Measurement : 1 Torr capacittance manometer and active penning gauge - Base Unite : System console with controller & PC2000 system for etching + manuals on CD