씨엔씨
WET_2011
8년
주장비
생산
화합물 전처리·분석장비 > 달리 분류되지 않는 화합물 전처리 분석장비 >
2011-01-27
75,600,360원
고정형
시간별
20,000원
⦁ Pre-cleaning
Diffusion cleaning / Pre-oxidation cleaning
Pre-CVD, Metal, Silicide cleaning
⦁ Post-cleaning
PR strip, Solvent strip, Post-CMP cleaning
Post-CVD, Metal cleaning
⦁ Etching
Nitride strip, oxide etching, contact hole etching
Positive photoresist coating 및 develop만 auto공정 진행.&N&T&I&S&1)GXR601: 1~1.4um (Positive photoresist)2)AZ 300 MIF: GXR601 developer3)Size: 8inch, 6inch4) HMDS, hotplate, coolplate&N&T&I&S&process