Nanophotonics
senstivity 90nm
4년
주장비
계측
광학·전자 영상장비 > 현미경 > 달리 분류되지 않는 현미경
2009-12-24
90,000,000원
고정형
원
1. 용도 : - 반도체 공정장비용 세라믹소재의 내플라즈마성을 평가 - Si wafer상 오염입자 크기, 분포, 개수 측정 2. 규격 수량 ① 주 장치 Main system: - substrate diameters : 200, 300 mm - Substrate thickness from 200 μm up to 1 mm - Wafer loading : Manual - Wafer fixation Vacuum chuck with clamps for each wafer size - Particle sensitivity : 0.09 μm LSE - Size ranges : 0.09 ~ 0.12 μm, 0.12~ 1.0 μm, 1.0 ~ 10 μm - Scanning times : < 150 sec ? Repeatability 3 % (1σ> 1000 particles) ② 악세사리 Control system: - Hardware Integrated Industrial PC and monitor, printer - Operating system Windows XP Professional Software : -Display modes Particle map, particle histogram,histogram - Available data Raw data, lot measurement results, - Output Maps, histograms, and tables
Main system: - substrate diameters : 200, 300 mm - Substrate thickness from 200 μm up to 1 mm - Wafer loading : Manual - Wafer fixation Vacuum chuck with clamps for each wafer size - Particle sensitivity : 0.09 μm LSE - Size ranges : 0.09 ~ 0.12 μm, 0.12~ 1.0 μm, 1.0 ~ 10 μm - Scanning times : < 150 sec ? Repeatability 3 % (1σ> 1000 particles) ② 악세사리 Control system: - Hardware Integrated Industrial PC and monitor, printer - Operating system Windows XP Professional Software : -Display modes Particle map, particle histogram,histogram - Available data Raw data, lot measurement results, - Output Maps, histograms, and tables