"본 장비는 X선을 이용하여 표면의 결합에너지를 측정함으로써 시료의 표면결합구조 및 원소구성을 분석하는 장비이다.1. High performance XPS system for surface analysis techniques. 2. The analysis chamber should be designed for below [장비의 특징]1) Microfocused Monochromated XPS2) Small area XPS, ARXPS (Angle Resolved XPS)3) Depth profiling 4) Windows XP PRO based Data system 5) The system should be fully automated from sample loading to report generation.[주요사양]1. Type : Spherical sector analyser or equivalent 2. Mean diameter : 250mm or equivalent 3. Operation mode : CAE or equivalent 4. Energy analysis range : 0 to 2,000eV or equivalent5. Ultimate Energy resolution : 0.5 eV FWHM6. Ultimate spatial resolution 30 μm7. XPS on Insulators : C 1s energy resolution (eV) 0.85 eV 8. Lens type : Multi-element input lens or equivalent 9. Analyser Housing : Mu-metal shielded or equivalent 10. Detector : 128-channel detector"