1. Substrate size : 100mm±0.05mmX100mm±0.05mm (t : 0.3~1.1mm±0.02mm)
Tag glass can be handled with special Jig.
2. Loading capacity : Glass 1EA
3. Chamber type : Square & Vertical
4. Plasma type : ICP
5. Plasma source : RF Power
- Output : 300 W
- Frequency : 13.56 MHz
- Power supply and Matching box 일체형 With Matching network
6. Hi-vac. pump : TMP ( ~400L/sec )
7. Low-vac. pump : Rotary pump
8. Process Pressure : ≤ 5.0×E-6 torr/min (2시간이내)
9. MFC :
- Ar : 200 sccm
- O2 : 50 sccm
- N2 : 200 sccm
10. Pressure Control : Auto pressure control by Throttle Valve With Baratron gauge
11. Vacuum gauge : Full range gauge