- Thickness and optical N, K measurement by a spectrometer with a grating and a linear CCD - Accuracy : ≤ ± 1 nm (SiO2(100 nm) on Si Wafer 기준) - Stage Size : ~ 300 mm x 300 mm - Measurement Range : 100 Å~ 35 ㎛(Depends on Film Type) - Spot size : 40 ㎛/20 ㎛, 4 ㎛(option) - Measurement Speed : 1 ~ 2 sec./site(fitting time) - Revolving nosepiece : Quintuple Revolving Nosepiecs - Focus : Coaxial Coarse and Fine Focus Controls - Incident illumination : 12 v 100 W Halogen Lamp