ㅇ 과제명 : 광통신부품/서브시스템 시제품 생산지원사업
ㅇ 수행연도 : 2005.01~2009.12
ㅇ 과제책임자 : 한택상

ㅇ 특징 : 유전체 광학박막에 대한 진공 전자빔 증착장비
ㅇ 성능
1) Vacuum Chamber Capability
- Inner diameter : Dia. 1200 mm
- Ultimate pressure : 8.0×10-7 torr (12 hrs)
- Operating pressure : 2.0×10-5 torr
- Max. heating temperature : 350C
- Temperature tolerance : 10C
- Thin film uniformity : 2.0 nm (at 550 nm)
- Batch repeatability : 2.5 nm (run to run)
2) Pumping System
- Cryo pump (2 ea)
ㆍ Pumping speed : each of 14,000 L/s
ㆍ Ultimate pressure : 1.0×10-9 torr
ㆍ Compressor (2 ea each)
- Oil rotary pump with oil mist filter
ㆍ Pumping speed : 3,000 L/min
ㆍ Ultimate pressure : 5.0×10-3 torr
- Mechanical booster pump
ㆍ Pumping speed : 23,000 L/min
ㆍ Ultimate pressure : 7.5×10-4 torr
- Vacuum guage
ㆍ Ion gauge : 1 ea
ㆍ Convectron gauge : 2 ea
- Vacuum valves
ㆍ Air cylinder type
ㆍ Main valve : 2 unit
ㆍ Roughing valve : 1 unit
ㆍ Venting valve : 2 unit
ㆍ Foreline valve : 2 unit
3) Electron Beam System
- Number of guns: 1
- Number of crucibles : 12
- Deflection angle : 180degree
- Max. power supply output power : 10 kW
4) Ion Beam System
- Ion energy : 200 eV
- Distribution angle : 60degree
- Gas flow : 10～30 sccm
- Power output current : 4 kW
5) Deposition Monitoring and Control System
- Deposition controller : IC-5 (Inficon)
- Thickness accuracy : 0.5 %
- Number of sensor head : 1
6) Processing Gas Supply System
- For electron beam : O2
- For ion beam : Ar, O2
- MFC for each gas
- Accuracy : 1.5 %
- Repeatability : 0.25 %
- Control range : 0~100 sccm