High-throughput, high-precision, direct write laser lithography system for :
▶ Photo-mask production
▶ Direct write applications
▶ Gray-scale exposures
▶ Maskless lithography
▶ Any flat material coated with a photosensitive layer
The system main features are :
▶ Minimum feature size : 0.6㎛
▶ Substrate size : Up to 200×200㎜ (8 × 8 inches)
▶ Over 1.5M dpi using a 10㎚ writeable address grid
▶ High-throughput for photo-mask production
The system is four machines in one :
▶ Mask-pattern generator
▶ Mask aligner
▶ Lithography stepper
▶ Metrology and alignment system for CD measurements and layer-to-layer alignment
The greatest advantages to the systems include :
▶ Simple design and ease of operation
▶ Low operating costs and virtually no maintenance costs
▶ Precision
▶ Versatility
▶ Small size
▶ Flexible for customized applications
▶ Optional Gray Scale imaging
▶ Rapid prototyping of 2D and 3D micro-structures
▶ The low cost makes it suitable for prototypes, research and development, academic institutions
▶ Any application that requires high precision, high resolution micro-structures.