광통신용 LD/PD 에피성장 장치
모델명: D180 LDM
제조업체: Veeco (미국)
◦적용가능 기판크기 : 2인치 Wafer 6장
◦Reactor 형태 : Vertical Sus chamber
◦Susceptor : Moly coated graphite
◦Rotation speed : 10rpm～1500rpm
◦in-situ 측정 : Real-temp wafer measurement system
◦MO-source line : TMGa, TMAl, TMIn,
◦Hydride line : AsH3, PH3
◦Dopant line : Si2H6, DeZn,
◦Bath for MO source : Over temp. protection (-10～30℃)

◦안전시스템 : Interlock system

- Power, Low gas pressure, Pneumatic air pressure
- Low Cool water pressure, Over pressure at vacuum
- 유독가스 감지시스템 : H2, AsH3, PH3