과제명 : 반도체광원 시험생산 기술지원사업
과제 책임자 : 김왕기



A. Specification :
1. Growth system
1) Overview
․High efficiency GaN growth chamber.
․Inlet Flow Flange with water-cooled coldplate.
․Water-cooled susceptorless spindle rotation system, including integrated magnetofluidic rotation mechanism.
․Reactor temperature management system including water to water heat exchanger with temperature, flow, and water level alarms.
․Water-cooled baseplate assembly.
․Low differential pressure MFCs for alkyl distribution on Flow Flange.
․Pressure regulation network with low differential pressure MFCs for hydride and shroud distribution on Flow flange.
․MFC purged five-position viewport for in-situ measurements.
․Needle valves for gas purge of viewports and pass-through flange.
․Mechanical Switch gauge for overpressure monitoring.
․DC Power Supplies for heater power.
․Dual differential pumped o-ring seals for reactor flanges with pressure monitor.

2) Heater system
․Proprietary Gen V metallic heater filament
․Three zone resistive heater assembly with high temperature heat shields, insulators, and electrical feedthroughs.

3) Loadlock and platter transfer system
․High vacuum aluminum loadlock chamber for wafer loading.
․Pneumatically controlled, interlocked gatevalve for isolation between growth chamber and loadlock chamber.

․Pressure measurement of loadlock Chamber.
․Toxic gas sampling port.
․Mechanical Switch gauge for overpressure monitoring.
․Semi-automatic transfer arm, incorporating a precision magnetic manipulator.

2. Source handling system
1) MO source supply system
․9 MO-source lines : 1 TMGa standard, 1 TEGa standard, 1 TMAl double dilution, 2 TMIns, 1 Cp2Mg, 2 standard spare, 1 double dilution spare
․Water cooled version of Liquid Refrigerator Bath - Quantity : 7
a. Operating temperature range : -30 ℃ to 200 ℃
b. Adjustable over-temperature protection.
c. Bath cavity dimensions : 8.5" x 8.5" x 9.8"

2) Hydride source supply system
․NH3 : Single Input with 80L MFC
․H2 : Single Input with 100L MFC
․N2 : Single Input with 100L MFC
․Hydride Dopant (SiH4) : Single Input with Dilution Network Manifold

3) Phantom Line for Alkyl Injector Block - Direct Input MFC to injector block

3. Electronic and control system
1) System Electronics and Control Modules
․Standard control modules for substrate rotation, reactor temperature control, reactor pressure, system logic control, and pump activation.
․Integrated power load center with emergency power off switch.
․microprocessor unit with analog and digital control boards, input boards, and ethernet port for communication.

2) DeviceNet control system
․Digital devices connected into a digital network.
․Allen Bradley PLC.
․Compliant to ODVA standard.

3) PyroControl Temperature Control System
․Sekidenko three-sensor single color optical fiber pyrometer for temperature measurements.
․Integrated temperature control scheme.