· Chamber size : Φ500xH4602
· Substrate Assy part : 6"(rotation speed : 10~60rpm)
· PC제어방식
· Sputter gun part : 4"(2set)
→ Target size - 4"x1/4", Magnet - Nd-Fe-B, Tilting Angle - 30°
· pumping system : Turbo pump(800ℓ/sec)
· MFC : MKS Ar, N2, O2
· DC power supply : 1kw, RF power supply : Ys 600W